Master Thesis: Deposition and Etching of amorphous carbon films for Nanopatterning applications(m/w/x)

City: Dresden Date: Jun 12, 2025 # Master Thesis: Deposition and Etching of amorphous carbon films for Nanopatterning applications Starting from 01.09.2025**,** an exciting student position in the field of semiconductors engineering is available. The goal is to evaluate the fabrication of advanced structures using a novel hard mask material, amorphous carbon. The work will primarily focus on two key processes, deposition with PE-CVD (Plasma Enhanced Chemical Vapor Deposition) and Reactive Ion Etching. While amorphous carbon hard masks offer clear advantages such as high selectivity and chemical inertness during etching, the integration of these processes within lithography constraints is crucial for achieving the desired structures for the fabrication of micro and nano-devices. The main applications for this research include silicon photonics, quantum computing as well as continuous down-scaling for semiconductor devices. The continuous development of these technologies in cooperation with industry partners is carried out in the business unit CNT (Center Nanoelectronic Technologies) at Fraunhofer IPMS in Dresden. The CNT researches 300 mm wafers for microchip stakeholders in clean room and lab facilities, offering development and services for ULSI level in FEoL and BEoL areas of various CMOS technology nodes. **What you will do** * Process workflow setup and execution for plasma deposition and etching * Amorphous carbon film deposition with PE-CVD; characterization via ellipsometry and atomic force microscopy * Reactive Ion Etching evaluation of test structures using amorphous carbon hard masks * SEM analysis of structures; feedback loops for refining deposition and etching parameters * Data analysis and interpretation for workflow optimization * Process window assessment for application-specific integration requirements **What you bring to the table** * **Education**: Bachelor's degree in Physics, Materials Science, Process Engineering, Chemistry, or a related field * **Must Have**: Initial experience in materials science, vacuum and plasma technologies, and semiconductor manufacturing processes, preferably in thin film characterization, deposition, or etching * **Nice to have**: Capability to handle and analyze large datasets using tools such as Excel, Origin, or MATLAB * **Soft Skills**: Enthusiasm for working in an interdisciplinary team within a cleanroom environment * **Language**: Fluent in English, knowledge of German is a plus **What you can expect** We offer you an exciting topic and individual support in the preparation of your thesis by experienced employees. A motivated and dynamic team awaits you in a very well equipped, research and development environment. In addition, we offer you connecting points within the framework of your studies or your career entry, e.g. a following PhD, the beginning of your scientific career as a junior scientist at Fraunhofer IPMS or becoming an engineer. We support you in this process! The scientific work will be carried out in the business unit **Center Nanoelectronic Technologies** at Fraunhofer IPMS in Dresden. The examination takes place via affiliation with a German university of applied sciences and is governed by the respective state university law. The weekly working time is to be agreed individually. The position is temporary for the time of the scientific work. The duration is flexible according to agreement and possible study guidelines. We value and promote the diversity of our employees' skills and therefore welcome all applications - regardless of age, gender, nationality, ethnic and social origin, religion, ideology, disability, sexual orientation and identity. Severely disabled persons are given preference in the event of equal suitability. **Job Segment:** Chemical Research, Materials Science, Research Scientist, Engineering, Bilingual, Science, Research